Block copolymers are known to spontaneously self-assemble into periodic nanoscale morphologies with characteristic feature sizes of 5-50 nm, making them attractive materials for templating and scaffolding nanostructures. In particular, the use of block copolymers in lithography processes is considered an important strategy to overcome the limitations of current photolithography tools and enables sub-20 nm features in semiconductor patterning. We are interested in understanding self-assembly and directed self-assembly processes and in developing methods to improve patterning using block copolymers.